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  • sputtering targets - testbourne ltd

    Sputtering Targets - Testbourne Ltd

    SuperVac® Sputtering Targets. Most sputtering target materials can be fabricated into a wide range of shapes and sizes. Commonly used targets are circular or

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  • sputtering targets & deposition materials

    Sputtering Targets & Deposition Materials

    Semicore offers a wide assortment of sputtering targets including gold, We supply the most commonly requested target shapes - round, rectangular, Ring, ConMag,

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  • sputtering targets (pvd, cvd) - zzsputteringtarget

    Sputtering Targets (PVD, CVD) - zzsputteringtarget

    It is commonly used for thin-film deposition, as well as analytical techniques. sputtering target pellets, sputtering target slugs, sputtering targets target,

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  • chapter 3: sputtering phenomena | engineering360

    Chapter 3: Sputtering Phenomena | Engineering360

    Learn more about Chapter 3: Sputtering Phenomena on GlobalSpec. sputtering is widely used for surface cleaning and etching, Target materials.

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  • arcing problems encountered during sputter deposition of aluminum

    Arcing Problems Encountered During Sputter Deposition of Aluminum

    commonly used to deposit aluminum sputtering region of the target material. ARCING PROBLEMS ENCOUNTERED DURING SPUTTER DEPOSITION OF ALUMINUM

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  • guide to choosing a coater, accessories and sputtering targets

    Guide to choosing a coater, accessories and sputtering targets

    Guide to choosing a coater, accessories and sputtering targets smaller grain size and are therefore widely used for high resolution Sputtering target

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  • sputtering targets | high purity elemental metals | aci

    Sputtering Targets | High Purity Elemental Metals | ACI

    ACI Alloys Inc stocks many standard crucibles for evaporation in commonly used you may need to reduce the thickness of the target, or else switch to RF-sputtering

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  • rf-sputtering principles - ifn trento

    RF-Sputtering principles - IFN Trento

    RF-Sputtering principles. Sputtering techniques are widely used in industrial process because high quality In RF sputtering there are a cathode (the target)

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  • target utilization in pulsed-dc sputtering processes

    Target Utilization in Pulsed-dc Sputtering Processes

    Such impact to the utilization of a target could target utilization in Pulsed-dc Sputtering Processes This very high instantaneous power is commonly attributed

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  • sputter coater principles technical data sheet

    Sputter Coater Principles Technical Data Sheet

    To achieve sputtering with this target For this reason gold-palladium and platinum are now widely used as sputtering system. The sputter head and

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  • kurt j. lesker company | aluminum al sputtering targets | vacuum

    Kurt J. Lesker Company | Aluminum Al Sputtering Targets | Vacuum

    Aluminum Al Sputtering Targets. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

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  • kurt j. lesker company | gold au sputtering targets | vacuum

    Kurt J. Lesker Company | Gold Au Sputtering Targets | Vacuum

    Gold Au Sputtering Targets. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find Deposited films of gold are used as layers in the production of semiconductors, sensors, batteries, and data storage.

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  • agc develops amorphous thin film using unique sputtering

    AGC Develops Amorphous Thin Film Using Unique Sputtering

    May 25, 2016 TOKYO, May 25, 2016 /PRNewswire/ -- AGC Develops Amorphous Thin Film Using Unique Sputtering Target Material. C12A7 Electride thin film Because the principle is simple and various sputtering devices are available, this method is used in a wide range of technical areas. Recently it has been used

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  • sputtering targets | high purity elemental metals | aci alloys inc

    Sputtering Targets | High Purity Elemental Metals | ACI ALLOYS INC

    At ACI Alloys, Inc. sputtering targets are made from high-purity elemental metals. Our full machine shop with lathes, mills, grinders, EDM and experienced staff are able to make intricate shapes with difficult material.

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  • sputtering targets | santa ana, ca - feldco international

    Sputtering Targets | Santa Ana, CA - Feldco International

    Sputtering Targets. Sputtering is a common technology that is widely used for thin film manufacturing. Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles, particualarly, in the laboratory, gas ions. Happens when kinetic energy of the

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  • target bonding issues - materion

    Target Bonding Issues - Materion

    However, the disadvantage of epoxy bonding is that the bond has a relatively high thermal resistance which limits the power densities (and therefore deposition rates) at which the sputtering targets can be used. Solder bonds inherently exhibit thermal resistance orders of a lower magnitude than adhesive bonds and

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  • zinc sputtering target, diam. × thickness zzsputteringtarget in. × zzsputteringtarget in., zzsputteringtarget

    Zinc sputtering target, diam. × thickness zzsputteringtarget in. × zzsputteringtarget in., zzsputteringtarget

    Application. Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

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