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Wholesale Tan Tantalum Nitride Sputtering Target

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  • Overview. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact

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  • Description. Tantalum nitride (TaN) is sometimes used to coat a film on silicon wafers to create thin film surface mount resistors. QSRE is a professional supplier of sputter targets. Please us for education discounts, or price quote for other sizes of tantalum nitride target. For Tantalum nitride sputter target, indium

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  • SAM offers TaN nitride-ceramic sputtering target with zzsputteringtarget% purity in various shapes & sizes for thin-film coating and deposition at competitive price.

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  • Structural and electrical properties of tantalum nitride thin films fabricated by using reactive . on the Ta target surface for sputtering, for many sites of the target surface are occupied by nitrogen atom, N2, or Ta-N Compared with the lattice constant of bulk fcc TaN, which is zzsputteringtarget Е [23], the relative increases of the lattice

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  • Nov 23, 2017 Abstract: Reactive magnetron sputtering was used to deposit tantalum nitride (Ta –N) thin films phases of Ta–N thin films, such as hex Ta2N, fcc TaN, orth zzsputteringtarget and orth Ta4N are 31, 20, zzsputteringtarget, films were deposited on Si (001) wafers using magnetron sputtering of a Ta target (5 cm in diameter and.

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  • Tantalum Nitride TaN bulk & research qty manufacturer. Properties, SDS, Applications, Price. Free samples Question? Ask an American Elements EngineerWHOLESALE/SKU 0000-742-6238 . American Elements produces to many High Purity (zzsputteringtarget%) Tantalum Nitride Sputtering Target standard grades when

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  • TaN resistors are fabricated and reported,. 2. Thin-film deposition and characteflzation. Tantalum nitride of various nitrogen compositions ayes deposited in a three tarot blRC 903 d,c. sputtefng system,. A tantalum target of zzsputteringtarget% purity was sputtered in an argon/ nitrogen plasma to pro(luce high-quality tar~talum niulde thin.

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  • The University of Texas at Arlington, 2014. Supervising Professor: Efstathios I. Meletis. Tantalum Nitride is chemically inert, oxidation resistant and hard. TaN and strike the surface of the wafers and form the deposited film. If the target is conductive, we use DC mode of sputter deposition and to deposit nonconductors.

    Online ChatSend Inquiry
  • kurt j. lesker company | tantalum nitride tan sputtering targets

    Kurt J. Lesker Company | Tantalum Nitride TaN Sputtering Targets

    Overview. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact

    Online ChatSend Inquiry
  • tantalum nitride (tan) sputtering targets - qs rare elements, llc

    Tantalum Nitride (TaN) Sputtering Targets - QS Rare Elements, LLC

    Description. Tantalum nitride (TaN) is sometimes used to coat a film on silicon wafers to create thin film surface mount resistors. QSRE is a professional supplier of sputter targets. Please us for education discounts, or price quote for other sizes of tantalum nitride target. For Tantalum nitride sputter target, indium

    Online ChatSend Inquiry
  • tantalum nitride (tan) sputtering target | nitride ceramic sputter

    Tantalum Nitride (TaN) Sputtering Target | Nitride Ceramic Sputter

    SAM offers TaN nitride-ceramic sputtering target with zzsputteringtarget% purity in various shapes & sizes for thin-film coating and deposition at competitive price.

    Online ChatSend Inquiry
  • structural and electrical properties of tantalum nitride thin  - arxiv

    Structural and electrical properties of tantalum nitride thin - arXiv

    Structural and electrical properties of tantalum nitride thin films fabricated by using reactive . on the Ta target surface for sputtering, for many sites of the target surface are occupied by nitrogen atom, N2, or Ta-N Compared with the lattice constant of bulk fcc TaN, which is zzsputteringtarget Е [23], the relative increases of the lattice

    Online ChatSend Inquiry
  • microstructure and mechanical properties of tan thin films  - mdpi

    Microstructure and Mechanical Properties of TaN Thin Films - MDPI

    Nov 23, 2017 Abstract: Reactive magnetron sputtering was used to deposit tantalum nitride (Ta –N) thin films phases of Ta–N thin films, such as hex Ta2N, fcc TaN, orth zzsputteringtarget and orth Ta4N are 31, 20, zzsputteringtarget, films were deposited on Si (001) wafers using magnetron sputtering of a Ta target (5 cm in diameter and.

    Online ChatSend Inquiry
  • tantalum nitride | american elements ®

    Tantalum Nitride | AMERICAN ELEMENTS ®

    Tantalum Nitride TaN bulk & research qty manufacturer. Properties, SDS, Applications, Price. Free samples Question? Ask an American Elements EngineerWHOLESALE/SKU 0000-742-6238 . American Elements produces to many High Purity (zzsputteringtarget%) Tantalum Nitride Sputtering Target standard grades when

    Online ChatSend Inquiry
  • thin-film tantalum-nitride resistor technology for  - science direct

    Thin-film tantalum-nitride resistor technology for - Science Direct

    TaN resistors are fabricated and reported,. 2. Thin-film deposition and characteflzation. Tantalum nitride of various nitrogen compositions ayes deposited in a three tarot blRC 903 d,c. sputtefng system,. A tantalum target of zzsputteringtarget% purity was sputtered in an argon/ nitrogen plasma to pro(luce high-quality tar~talum niulde thin.

    Online ChatSend Inquiry
  • reliability and characteristics of magnetron sputter deposited

    Reliability and characteristics of magnetron sputter deposited

    Apr 16, 2018 Tantalum nitride (TaN) films were deposited onto SiO2/Si and multilayer ceramic (MLC) substrates with a reactive direct current magnetron sputtering method. Aft. All TaN films were deposited using a reactive DC magnetron sputtering system with a 4 in-diameter metallic Ta target. SiO2/Si and multilayer

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  • tantalum nitride (tan) powder - reade advanced materials

    Tantalum Nitride (TaN) Powder - Reade Advanced Materials

    Pieces, targets, granules, and various powder distributions down to as small as 5 to 15 nanometers Tantalum nitride (TaN) films have been shown to provide a barrier to copper diffusion while at the same time promoting good adhesion between the copper lines and the 50 lbs. net weight bags, drums, and bulk bags

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  • characterization of tantalum nitride thin films

    CHARACTERIZATION OF TANTALUM NITRIDE THIN FILMS

    The University of Texas at Arlington, 2014. Supervising Professor: Efstathios I. Meletis. Tantalum Nitride is chemically inert, oxidation resistant and hard. TaN and strike the surface of the wafers and form the deposited film. If the target is conductive, we use DC mode of sputter deposition and to deposit nonconductors.

    Online ChatSend Inquiry
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