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New Design 99.99% Erbium Fluoride Sputtering Targets

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  • 13760-83-3 - erbium(iii) fluoride, anhydrous, reacton®, zzsputteringtarget

    13760-83-3 - Erbium(III) fluoride, anhydrous, REacton®, zzsputteringtarget

    Sputtering Targets-Pure Elements. It is highly employed as erbium doped fluoride fibers in optical Strontium fluoride, Puratronic®, zzsputteringtarget% (metals basis

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  • er2o3 erbium oxide | sputtering targets | vacuum engineering

    Er2O3 Erbium Oxide | Sputtering Targets | Vacuum Engineering

    Products. We manufacture and distribute sputtering targets and evaporation materials for all sputtering tools.

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  • crm-fluoride element,f, aluminium fluoride,cadmium fluoride

    CRM-Fluoride element,F, aluminium fluoride,Cadmium fluoride

    *** New Website *** Sputtering Targets. Erbium Fluoride : ErF3 : zzsputteringtarget% : zzsputteringtarget%. Sputtering Target, Evaporation material,

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  • crm-erbium element, er,erbium sputtering target, erbium tube

    CRM-erbium element, Er,Erbium sputtering target, erbium tube

    *** New Website *** Sputtering Targets. Erbium Fluoride. ErF3. REO/TREO:zzsputteringtarget%,zzsputteringtarget5%,zzsputteringtarget%. TREO:99%, zzsputteringtarget%. Sputtering Target,

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  • ytterbium fluoride (ybf3) sputtering target - heeger materials

    Ytterbium Fluoride (YbF3) Sputtering Target - Heeger Materials

    Condition: New product. Ytterbium Fluoride (YbF3) Sputtering Target can be use in semiconductor, chemical vapor deposition zzsputteringtarget%: More info.

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  • sputter targets - nanoshel a nanotechnology company

    Sputter targets - Nanoshel a Nanotechnology Company

    Sputter targets is a process whereby atoms are ejected from a solid Calcium Fluoride Sputtering Target (CaF2 Erbium Sputtering Target (Er, Purity: zzsputteringtarget%) N/A:

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  • magnesium fluoride (mgf2) sputtering target

    Magnesium Fluoride (MgF2) Sputtering Target

    Heeger Materials provides online Magnesium Fluoride (MgF2) Sputtering Target at a competitive applications and for new Sputtering Target:zzsputteringtarget% - zzsputteringtarget%.

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  • sputtering targets | vacuum engineering and materials co

    Sputtering Targets | Vacuum Engineering and Materials Co

    VEM has sputtering targets available in a wide variety of precious and non-precious materials including pure elements, compounds and alloys in purities ranging from zzsputteringtarget% to zzsputteringtarget99% for both R&D and production.

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  • 7783-48-4 - strontium fluoride, puratronic®, zzsputteringtarget% (metals

    7783-48-4 - Strontium fluoride, Puratronic®, zzsputteringtarget% (metals

    Sputtering Targets-Pure Elements. 10878 Strontium fluoride, Puratronic®, zzsputteringtarget% (metals basis) Erbium(III) fluoride, anhydrous, REacton®,

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  • sputtering targets(pvd coating, cvd coating)--sputtering

    Sputtering Targets(PVD Coating, CVD Coating)--Sputtering

    Stanford Materials supplies all kinds of sputtering targets at Tellruide Ceramic Sputtering Target Metal Sputtering Targets: Fluoride (CsF) zzsputteringtarget% ~ zzsputteringtarget%:

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  • fluoride ceramic | sputtering targets listing 1 | stanford advanced

    Fluoride Ceramic | Sputtering Targets Listing 1 | Stanford Advanced

    Fluoride Ceramic Stanford Advanced Materials manufactures & supplies sputtering materials like pure metals (zzsputteringtarget. rare earths, refactories), alloys & ceramics (zzsputteringtarget. oxides, nitrides) - Page 1.

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  • fluoride ceramic sputtering targets - mse supplies

    Fluoride Ceramic Sputtering Targets - MSE Supplies

    Fluoride Ceramic Target Materials for Sputtering or Laser Ablation Aluminum Fluoride (AlF3) Lithium Fluoride (LiF) Barium Fluoride (BaF2) Magnesium Fluoride zzsputteringtarget%, or higher purity; Applications: physical vapor deposition (PVD ) of thin films, laser ablation deposition (PLD), magnetron sputtering for semiconductor,

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  • sputtering targets | american elements ®

    Sputtering Targets | AMERICAN ELEMENTS ®

    Sputtering targets are available monoblock or bonded with dimensions and configurations up to 820 mm, and are produced with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices and the latest processing equipment, such as large area coating and flip-chip

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  • lanthanum fluoride (laf3) sputtering targets | fluoride sputter

    Lanthanum Fluoride (LaF3) Sputtering Targets | Fluoride sputter

    AS the purification of rare earth element is quite hard and it is important to be clean from contamination of other rare earth element, the purity of Lanthanum Fluoride (LaF3) sputter target is usually marked as LaF3/TREO zzsputteringtarget%(or zzsputteringtarget %) with TREOzzsputteringtarget% or zzsputteringtarget%. TREO means Total Rare Earth Oxide. For Lanthanum

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  • sputtering targets customization experters - crm

    Sputtering targets customization experters - CRM

    We also have an experienced research team who have developed many new and special sputtering targets, and also successfully made many trial orders and Thin film solar cell:Silicon sputtering targets, Gallium Arsenide (GaAs)zzsputteringtarget9%, ITO zzsputteringtarget%,Titanium metal zzsputteringtarget%,Aluminum Zinc Oxide (AZO) zzsputteringtarget%,Zinc Oxide

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  • sputtering targets - princeton scientific

    Sputtering Targets - Princeton Scientific

    Princeton Scientific Corp. offers Sputtering targets made of - Metals, non-metals and chemical compounds with purity from zzsputteringtarget% to zzsputteringtarget99%. . Europium, Eu, zzsputteringtarget%. Europium oxide, Eu2O3, zzsputteringtarget% - zzsputteringtarget%. Gadolinium, Gd, zzsputteringtarget%. Gadolinium fluoride, Gd2F3, zzsputteringtarget%. Gadolinium gallium garnet, Gd3Ga5O12, zzsputteringtarget%.

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  • sputter targets - nanoshel

    Sputter targets - Nanoshel

    NS6130-10-1036 Boron Nitride Sputtering Target (BN, Purity: zzsputteringtarget%), N/A. NS6130-10-1037 Boron Carbide Sputtering Target (B4C, Purity: zzsputteringtarget%), N/A. NS6130-10-1038 Bismuth Sputtering Target (Bi, Purity: zzsputteringtarget%), N/A. NS6130- 10-1039 Calcium Fluoride Sputtering Target (CaF2, Purity: zzsputteringtarget%), N/A.

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