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Multifunctional V Sputtering Target

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  • multifunctional zno:v thin films deposited by rf-magnetron

    Multifunctional ZnO:V thin films deposited by rf-magnetron

    Multifunctional ZnO:V thin films deposited by rf-magnetron sputtering from aerogel nanopowder target material

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  • multifunctional zno:v thin films deposited by rf-magnetron

    Multifunctional ZnO:V thin films deposited by rf-magnetron

    Multifunctional ZnO:V thin films deposited by rf-magnetron sputtering from aerogel nanopowder target material

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  • multifunctional high quality pipe titanium sputtering

    Multifunctional High Quality Pipe Titanium Sputtering

    Multifunctional High Quality Pipe Titanium Sputtering Target Made In China , Find Complete Details about Multifunctional High Quality Pipe Titanium Sputtering Target Made In China,High Quality Pipe Titanium Sputtering Target,Trade Assurance Titanium Tube Target,Sputtering Titanium Tube Target With Great Price from Other Titanium Supplier or

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  • multifunctional rotary iridium plate target for united

    Multifunctional Rotary Iridium Plate Target For United

    Multifunctional Rotary Iridium Plate Target For United Kindom , Find Complete Details about Multifunctional Rotary Iridium Plate Target For United Kindom,Rotary Iridium Plate Target,Hot Sale High Purity Nickel Sputtering Target,Titanium Aluminum Shooting Target from Other Titanium Supplier or Manufacturer-Baoji City Changsheng Titanium Co., Ltd.

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  • multifunctional bulk plasma source based on discharge with

    Multifunctional bulk plasma source based on discharge with

    Multifunctional bulk plasma source based on discharge with electron injection of the sputter target is a multifunctional device that can be

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  • hard multifunctional hf-b-si-c films prepared by pulsed

    Hard multifunctional Hf-B-Si-C films prepared by pulsed

    Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering. substrates using pulsed magnetron co-sputtering of a single B 4 C-Hf-Si target

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  • multifunctional nanocoating on synthetic fibres deposited

    MULTIFUNCTIONAL NANOCOATING ON SYNTHETIC FIBRES DEPOSITED

    Semana de Engenharia 2010 Guimarães, 11 a 15 de Outubro MULTIFUNCTIONAL NANOCOATING ON SYNTHETIC FIBRES DEPOSITED BY PULSED MAGNETRON SPUTTERING

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  • multifunctional bulk plasma source based on discharge with

    Multifunctional bulk plasma source based on discharge with

    Multifunctional bulk plasma source based on discharge with electron injection the target sputtering rate.

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  • kurt j. lesker company | vanadium v sputtering targets | vacuum

    Kurt J. Lesker Company | Vanadium V Sputtering Targets | Vacuum

    Material Type, Vanadium. Symbol, V. Atomic Weight, zzsputteringtarget. Atomic Number, 23. Color/Appearance, Silvery Gray Metallic. Thermal Conductivity, zzsputteringtarget W/zzsputteringtarget. Melting Point (°C), 1,890. Coefficient of Thermal Expansion, zzsputteringtarget x 10-6/K. Theoretical Density (g/cc), zzsputteringtarget. Z Ratio, zzsputteringtarget. Sputter, DC. Max Power Density*

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  • advantages of rotary sputtering targets vs. planar sputtering

    Advantages of Rotary Sputtering Targets vs. Planar Sputtering

    Apr 18, 2012 INDIUM: I have been asked to explain why someone would want to use rotary sputtering targets instead of planar sputtering targets. Certainly there is some expense involved with larger targets and new equipment (assuming you are currently using a planar system), but in a

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  • sputtering target and target bonding by indium corporation

    Sputtering target and target bonding by Indium Corporation

    NanoFoil® reactive multi-layer foil and NanoBond® simplify the sputtering target bonding process allowing target bonders to make reliable and repeatable bonds. The rapid and versatile nature of this novel bonding method offers process cost reductions over traditional bonding methods. Ceramic Sputtering Target

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  • combined magnetron sputtering and pulsed laser deposition of tio

    Combined magnetron sputtering and pulsed laser deposition of TiO

    May 31, 2017 The target is exposed to the PLD laser (the dark purple vertical plume in the picture) and to the plasma generated by the sputtering system (in light purple in At the optimal pressure of 5 mTorr the film has the highest value of SLD, which is similar to the tabulated value for bulk TiO2 (zzsputteringtarget vs zzsputteringtarget 10−6Å−2).

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  • sputtering targets - pvd products

    Sputtering Targets - PVD Products

    PVD Products provides sputtering targets for a wide range of applications from ferromagnetic, complex oxides, and semiconducting films. Our standard round target sizes range from 1 inch to 20 inches in diameter, and the rectangular targets are available in lengths up to and over 2000 mm in single or multiple- piece

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  • multi beam sputter deposition systems - polygon physics

    Multi Beam Sputter Deposition Systems - POLYGON PHYSICS

    Sep 7, 2016 Multi beam sputter deposition: a unique approach to thin film deposition based on ion beam sputtering for multicomponent materials research. is the possibility to depose uniformly in composition and thickness, or with controlled gradients, across stationary substrates, using very compact sputter targets.

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  • disk or annular sputter targets - ted pella

    Disk or Annular Sputter Targets - Ted Pella

    Prod #, Description, Unit, Price, Order / Quote. High purity 60mm (2 3/8) diameter Targets for Denton DESK II / DESK III / DESK IV/ DESK V, Edwards 150 B / SCANCOAT, Emitech K500/K550/K650 and Emscope SC500 sputter coaters. 91217, Copper Target, zzsputteringtarget% Cu (Ø60mm x zzsputteringtarget), each, $zzsputteringtarget

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  • experimental design approach for deposition optimization of rf

    Experimental design approach for deposition optimization of RF

    Jun 14, 2017 The sputtering power varied between 10 and 25 W for the zzsputteringtarget target and between 10 and 20 W for the zzsputteringtarget target. Note that the working pressure range and the working power were selected considering preliminary experiments of both films depositions. Non-selected

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  • sem sputter target material selection guide for coating non

    SEM sputter target material selection guide for coating non

    SEM sputter target material selection guide to achieve best results when coating non-conductive SEM samples and specimens.

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  • atc series sputtering systems - aja international

    ATC Series Sputtering Systems - AJA International

    AJA International ATC Flagship Series Sputtering Systems are versatile PVD coating tools which can be built in a variety of configurations to satisfy most (e- beam evaporation, thermal evaporation and PLD) , ion sources, facing target sputtering sources (FTS), masking systems, metal-sealed tops, bake jackets,

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