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  • hafnium (hf) sputtering target | pure metal sputter targets

    Hafnium (Hf) Sputtering Target | Pure Metal Sputter Targets

    SAM offers Hf pure-metal sputtering target with zzsputteringtarget% purity in various shapes & sizes for thin-film coating and deposition at competitive price.

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  • hafnium oxide (hfo2) sputtering targets - alb materials inc

    Hafnium Oxide (HfO2) Sputtering Targets - ALB Materials Inc

    ALB Materials Inc supply Hafnium Oxide (HfO2) Sputtering Targets and also provide bonding service with high quality at competitive price.

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  • hafnium nitride sputtering target | american elements

    Hafnium Nitride Sputtering Target | AMERICAN ELEMENTS

    Hafnium Nitride Sputtering Target HfN American Elements specializes in producing high purity Hafnium Nitride Sputtering Targets with the highest possible

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  • hafnium oxide (hfo2) sputtering target | oxide ceramic

    Hafnium Oxide (HfO2) Sputtering Target | Oxide Ceramic

    SAM offers HfO2 oxide-ceramic sputtering target with zzsputteringtarget%, zzsputteringtarget5%, zzsputteringtarget9% purity in various shapes & sizes for thin-film coating and deposition at competitive price.

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  • hfo2 hafnium oxide | sputtering targets | vacuum

    HfO2 Hafnium Oxide | Sputtering Targets | Vacuum

    Products. We manufacture and distribute sputtering targets and evaporation materials for all sputtering tools.

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  • hafnium nitride (hfn) sputtering targets - zzsputteringtarget

    Hafnium Nitride (HfN) Sputtering Targets - zzsputteringtarget

    Hafnium Nitride HfN Sputtering Targets. Material Notes. NOTE: Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.

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  • hafnium nitride (hfn) sputtering target - heeger materials

    Hafnium Nitride (HfN) Sputtering Target - Heeger Materials

    Heeger Materials (HM) is a supplier of Hafnium Nitride (HfN) Sputtering Target at a competitive price. HM stocks a vast assortment of sputtering target and provides customized services.

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  • sputtering targets - nitride ceramic targets - mse supplies

    Sputtering Targets - Nitride Ceramic Targets - MSE Supplies

    Sputtering targets with any chemical composition, purity (zzsputteringtarget%, zzsputteringtarget9%, zzsputteringtarget99%, zzsputteringtarget999%), and sizes can be custom-made to meet customer-provided specifications. MSE Supplies has a price matching policy and guarantees the best prices for all our sputtering target products.

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  • hafnium nitride (hfn) sputtering target | nitride ceramic sputter

    Hafnium Nitride (HfN) Sputtering Target | Nitride Ceramic Sputter

    SAM offers HfN nitride-ceramic sputtering target with zzsputteringtarget% purity in various shapes & sizes for thin-film coating and deposition at competitive price.

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  • hafnium oxide sputtering target | american elements ®

    Hafnium Oxide Sputtering Target | AMERICAN ELEMENTS ®

    Hafnium Oxide Sputtering Target HfO2 bulk & research qty manufacturer. Properties, SDS, Applications, Price. Free samples program. Term contracts & credit cards/PayPal accepted.

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  • hafnium sputtering target | american elements ®

    Hafnium Sputtering Target | AMERICAN ELEMENTS ®

    Hafnium Sputtering Target Hf bulk & research qty manufacturer. Properties, SDS, Applications, Price. Free samples program. Term contracts & credit cards/PayPal accepted.

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  • testbourne ltd

    Testbourne Ltd

    ISO 9001:2008 Registered Company. Compoun. Boride S. Cr2B, Cr. TaB2, Ti. Carbide. B4C, Cr3. WC+Co,. Fluoride. AlF3, Ba. MgF2, N. Nitride S. AlN, BN. Oxide Sp Hafnium Hf,. Holmium Ho,. Indium In,. Iridium Ir,. Iron Fe,. Lanthanum La,. Lead Pb,. Lutetium Lu,. Magnesium Mg,. Manganese Mn,. Metal Sputtering Target.

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  • vem thin film evaporation guide - vacuum engineering & materials

    VEM Thin Film Evaporation Guide - Vacuum Engineering & Materials

    sublimes. Hafnium Nitride. HfN. 2852. zzsputteringtarget. —. —. —. —. —. —. HfN films have been produced by reactive RF sputtering of Hf in N2 + Ar. Hafnium Oxide. HfO2. 2812. zzsputteringtarget. —. —. —. ~2500. eBeam (fair) graphite, W. Can be fabricated by reactive evaporation in O2 or using bulk source material. Post process annealing at.

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  • thin film depth profiling by ion beam analysis - analyst (rsc

    Thin film depth profiling by ion beam analysis - Analyst (RSC

    Aug 31, 2016 IBA depth profiling is based on the energy loss of the probing beam in the target as well as the energy loss of the scattered or recoiled nuclei. It is not deliberately destructive – it does not sputter the sample away to mass-analyse the sputtered atoms as SIMS does, for example – so you get the sample back

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  • sputtering targets, sputtertargets, sputtertarget - oxides | evochem

    Sputtering Targets, Sputtertargets, Sputtertarget - Oxides | EVOCHEM

    EVOCHEMs product program contains a wide range of oxide sputtering targets optimized for the special requirements of Sputtering Processes. Our oxide sputtering targets offer a better yield, process stability and more design freedom for the optical coating engineer. Many oxide Hafnium Oxide, HfO2, 2N-4N. Holmium

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  • evaporation materials oxides | evochem

    Evaporation Materials Oxides | EVOCHEM

    Europium Oxide, Eu2O3, Eu2O3/TREO:2N-3N min, TREO:2N min. Gadolinium Oxide, Gd2O3, Gd2O3/TREO:2N-3N min, TREO:2N min. Gallium Oxide, Ga2O3, 4N-5N. Germanium Oxide, GeO2, 4N-5N. Hafnium Oxide, HfO2, 4N. Holmium Oxide, Ho2O3, Ho2O3/TREO:2N-3N min, TREO:2N min. Indium Oxide, In2O3, 2N -5N.

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  • silicon nitride - thomasnet

    Silicon Nitride - ThomasNet

    Results 1 - 25 of 56 Distributor of silicon nitride materials for heat engine part, nozzles, bearings, valves, and surface reforming applications. . Applications include rods & tubes, sputtering targets, ball bearings, wear parts & tiles & flat tile panels. ISO 9001: 2008 certified women-owned custom fabricator of silicon nitride.

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  • tin oxide - thomasnet

    Tin Oxide - ThomasNet

    Results 1 - 25 of 35 Available in purities of zzsputteringtarget9 percent, zzsputteringtarget95 percent and zzsputteringtarget99 percent and in sputtering targets and evaporation pieces. . calcium phosphate, calcium hydroxyapatite, cerium oxide, cobalt oxide, copper oxide, erbium oxide, iron oxide, gadolinium oxide, hafnium oxide, indium tin oxide (ITO), indium

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