TEL: 86-18137338517
EMAIL: admin@scarcemetal.com

Widely Used Tb2S3 Sputtering Target

 Home » News
  • magnetron sputtering - penn engineering

    Magnetron sputtering - Penn Engineering

    Magnetron sputtering is increasingly widely used to produce thin coatings. Magnetron target by the bombardment of high-energy particles.

    Online ChatSend Inquiry
  • semiconductors | american elements

    Semiconductors | AMERICAN ELEMENTS

    Gold sputtering target; Copper sputtering target; Aluminum sputtering target; Silve sputtering target; Transparent conductive oxides are important in electrooptical devices such as sensors and light emitting diodes. Aluminum zinc oxide; Indium tin oxide; Also of note is an important variant of PVD termed reactive sputtering.

    Online ChatSend Inquiry
  • what is sputtering? magnetron sputtering? - semicore

    What Is Sputtering? Magnetron Sputtering? - Semicore

    It is widely used in the optical and architectural glass industries. By utilizing Reactive Co-Sputtering of two target materials such as Silicon and Titanium with

    Online ChatSend Inquiry
  • sputtering targets, evaporation materials | aemdeposition

    Sputtering Targets, Evaporation Materials | AEMDeposition

    How to work with AEM. The thin film deposition materials provided by AEM are widely used all over the world. Over the past 10 years, AEM is always trying to provide you with reliable sputtering target, evaporation materials, etc. at the most competitive prices.

    Online ChatSend Inquiry
  • sputtering targets (pvd, cvd) - zzsputteringtarget

    Sputtering Targets (PVD, CVD) - zzsputteringtarget

    It is commonly used for thin-film deposition, as well as analytical techniques. sputtering target pellets, sputtering target slugs, sputtering targets target,

    Online ChatSend Inquiry
  • the development of functional thin films and sputtering

    The Development of Functional Thin Films and Sputtering

    The Development of Functional Thin Films and Sputtering Target Materials for Electronic Devices Sputtering is widely used in the production sputtering target.

    Online ChatSend Inquiry
  • kurt j. lesker company | iron fe sputtering targets

    Kurt J. Lesker Company | Iron Fe Sputtering Targets

    Target Bonding; Process Equipment Iron (Fe) Sputtering Targets Iron is the most commonly used metal in the world. It is metallic-gray in color,

    Online ChatSend Inquiry
  • 1 coating materials for different deposition techniques

    1 Coating Materials for Different Deposition Techniques

    Sputtering of metallic layers is straightforward. For the sputtering of dielectric layers there are two different approaches. The first is to use ceramic target materi-als of the desired layer composition. The second is a reactive sputtering process, where a metallic target is sputtered in a reactive atmosphere of oxygen or nitrogen.

    Online ChatSend Inquiry
  • kurt j. lesker company | aluminum al sputtering targets | vacuum

    Kurt J. Lesker Company | Aluminum Al Sputtering Targets | Vacuum

    Aluminum Al Sputtering Targets. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

    Online ChatSend Inquiry
  • kurt j. lesker company | gold au sputtering targets | vacuum

    Kurt J. Lesker Company | Gold Au Sputtering Targets | Vacuum

    Gold Au Sputtering Targets. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find Deposited films of gold are used as layers in the production of semiconductors, sensors, batteries, and data storage.

    Online ChatSend Inquiry
  • sputtering targets | santa ana, ca - feldco international

    Sputtering Targets | Santa Ana, CA - Feldco International

    Sputtering Targets. Sputtering is a common technology that is widely used for thin film manufacturing. Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles, particualarly, in the laboratory, gas ions. Happens when kinetic energy of the

    Online ChatSend Inquiry
  • target bonding issues - materion

    Target Bonding Issues - Materion

    However, the disadvantage of epoxy bonding is that the bond has a relatively high thermal resistance which limits the power densities (and therefore deposition rates) at which the sputtering targets can be used. Solder bonds inherently exhibit thermal resistance orders of a lower magnitude than adhesive bonds and

    Online ChatSend Inquiry
  • sputtering targets - testbourne ltd

    Sputtering Targets - Testbourne Ltd

    The sputtering gas is often an inert gas such as argon. For efficient momentum transfer projectile mass must match target mass, so for sputtering light elements neon is also used and for heavy elements krypton or xenon. Reactive gases are used to sputter compounds. The chemical reaction can occur on the target surface,

    Online ChatSend Inquiry

Related Items